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Ga:ZnO Al:ZnO CdSnO3 NiSnO3 CIGS MoSnO3 TiO2 SnO2

Indium tin oxide (ITO) is the most common transparent conductive oxide used with high conductivity and optical transparency and it can be deposited at relatively low temperatures meaning is can be applied to various different substrates, the most common of which being glass.

ITO targets are typically composed of a mix of In2O3 and SnO2, with 90:10 ratio being the most common as it has a good compromise of transparency and conductivity. ITO targets are light yellow to pale green color in target form but transparent in thin film form.

The Common Uses of ITO Thin Films

In commercial product applications, ITO is commonly used in touch screens, displays, solar cells, and antireflection coatings. ITO thin films are highly transparent and can be used to reduce reflections from reflective surfaces, such as displays. Additionally, the thin film&#;s electrical conductivity makes it ideal for use in touch screens, as it can be used to detect the location of a user&#;s finger or stylus on the surface. ITO thin films are also used to make transparent conducting electrodes for LEDs and solar cells, as they are able to efficiently capture and transfer current without interfering with the light entering the cell.

Typical Properties of ITO in Thin Film Form

ITO thin films generally have a high transparency, with a visible light transmission of around 80-90%. The sheet resistance of ITO thin films is typically between 10-20 ohms/square for 140-180 nm, and this value decreases as the film thickness increases and vice versa. Additionally, the optical and electrical properties of ITO thin films can be tailored by varying the composition of the sputtering target. For example, an In-SnO2 target will generally produce a thin film with higher transparency and lower sheet resistance compared to an In2O3-SnO2 target.

Typical Deposition Conditions for ITO Thin Films by Sputtering

ITO thin films can be deposited by sputtering using a range of deposition parameters. Generally, the sputtering pressure is set between 0.1-1 mTorr, and the sputtering power is set between 0.5-2 kW. The deposition temperature is typically kept between room temperature and 300°C, and the deposition rate is typically around 0.5-2 nm/s.

Typical Deposition Conditions for ITO Thin Films by Pulsed Laser Deposition

ITO thin films can also be deposited by pulsed laser deposition (PLD). The deposition parameters for PLD with an oxygen pressure of 5-50 mTorr if films are oxygen deficient then they can appear grey. ITO can be deposited from room temperature to 400C which means it can be deposited on plastics as well as glass and other substrates. Laser energy density is typically 0.75-1.5 J.cm-2

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Al: ZnO

ITO : From Sputter Targets to Smart Devices

Introduction of ITO

Indium tin oxide (ITO) proves extensively useful in electronics due to its unique optical and electrical properties. ITO combines the conductivity of tin dioxide and the transparency of indium trioxide. Let's explore ITO's characteristics, parameters, and applications - from sputtering targets to smartphones.

Firstly, ITO has a high density of 6.8 g/cm3. It also boasts a Young's modulus of 116 GPa for sputtered films with 10wt% tin dioxide. Furthermore, standard ITO exhibits electrical conductivity of approximately 1.3 x 104 S/cm. Etching methods also vary - wet etching utilizes oxalic acid while plasma etching employs a gas mixture.

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Sputtering ITO

Key to many applications are ITO sputtering targets. As a composite of indium and tin oxides, high-quality targets exceed 99% density. This ensures properties such as minimized resistivity and maximized conductivity and strength. Such targets deposit onto substrates at lower temperatures. This creates transparent conductive films with reduced resistivity and enhanced transmittance for versatile uses.

ITO thinfilm

Devices with ITO

ITO enables two critical components. ITO films offer superb conductivity, transparency, hardness and stability. Widely applied in LCDs, PDPs, OLEDs, touchscreens, solar panels and more, films adjust light and resistance via indium-tin ratios.

Indium tin oxide film (ITO film) is a semiconductor transparent conductive film prepared through either vacuum evaporation or sputter deposition. ITO film offers not only high electrical conductivity but also high visible light transmittance. In addition, it exhibits excellent mechanical hardness and good chemical stability. As a result, ITO films see widespread use in manufacturing various electronic devices. Specifically, they are utilized in liquid crystal displays, plasma displays, electroluminescent displays, touch panels, solar cells, and more. Furthermore, the transmittance and resistance of ITO film can be controlled by adjusting the ratio of In2O3 to SnO2, which is typically 1:9.

 Similarly, indium tin oxide conductive glass (ITO glass) involves depositing an ITO film layer onto soda-lime-based or silicon-boron-based glass through techniques such as sputtering or evaporation. Likewise, ITO glass finds extensive application in electronic displays. Specifically for LEDs, a silicon dioxide barrier layer is applied beforehand to prevent sodium ions from diffusing into the liquid crystal. Correspondingly, the substrates for LED ITO glass regularly employ ultra-float glass with characteristic tin surface ripples.

QS's ITO sputter target 

ITO Sputter target

Moreover, QS Advanced Materials Inc. plays an important role as a supplier of various sputtering targets, including ITO targets. They cater to both the research and semiconductor industries. Likewise, they offer different molding methods for ITO sputter targets such as spraying, cold isostatic pressing, hot isostatic pressing, and wet forming. Consequently, obtaining these targets from QS enables the high-quality production of ITO films and ITO glass.

Summary 

In conclusion, ITO plays a crucial role in the electronics industry, from its use as an ITO sputter target to the production of ITO films and ITO glass for a range of devices. QS Advanced Materials Inc. serves as a reliable supplier, providing a comprehensive selection of sputtering targets, including ITO, to meet the needs of research and semiconductor manufacturing.

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